Freezing Material Development for Double Patterning Process
نویسندگان
چکیده
منابع مشابه
Double Patterning for Memory ICs
In order to continue technology shrink roadmaps and to provide year by year smaller chips with more functionality, nearly all of the leading edge semiconductor companies have adopted double patterning process technologies in their fabrication lines to bridge the time until next generation EUV lithography reaches production maturity. Double patterning technology can be classified into two major ...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2009
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.22.641